发明名称 ELECTRONIC BEAM EXPOSURE DEVICE
摘要 PURPOSE:To duplicate picture-drawing speed by enabling 2 pictures of the equivalent pattern to be drawn at the same time in such a manner that when electronic beam exposure is not required, the electron is utilized for drawing other picture so that energy loss can be minimized. CONSTITUTION:An acceleration electron is given to a deviation electrode unit 27 through an adjustment electrode 26 of a lens 25. At this time, a blacking electrode 27 eperates in accordance with a program, and by a pattern generation command and on the basis of existence or non-existence of a potential difference, an electronic beam is guided to introduction electrodes 301 and 302 of mirror cylinder units 291 and 292. The electronic beam is deviated by electrodes 311 and 312, respectively, and draw pictures on base plates 321 and 322. By using a positive type resist for the base plate 321 and a negative type resist for the base plate 322, it is possible to form completely equivalent patterns on these base plates at the same time, and thereby it is possible to duplicate the picture-drawing speed while minimizing energy loss.
申请公布号 JPS558010(A) 申请公布日期 1980.01.21
申请号 JP19780079362 申请日期 1978.06.30
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 MOTOYAMA KAKUKI;TAKIGAWA TADAHIRO
分类号 H01L21/027;H01J37/30 主分类号 H01L21/027
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