| 摘要 |
<p>PURPOSE:To provide an inexpensive active-matrix liq. crystal display element without deteriorating the voltage-current characteristic by limiting a process to expose a resist only to two stages, i.e., a stage to work a first metal film, a first metal oxide film and a second metal film at the same time and a stage to work a transparent conductive film. CONSTITUTION:First metal layers 12a and 12b are deposited on the surface side of a transparent substrate with a TaOx film formed on the surface, the surface is anodized to form a first metal oxide film 13 which is heat-treated, and a second metal film 14 is deposited. The first metal films 12a and 12b, the first metal oxide film 13 and the second metal film 14 are then simultaneously worked with a resist of specified shape as a mask. The side face of the first metal film 12 is then anodized to form a second metal oxide film 15. Subsequently, a transparent conductive film 16 such as an ITO film to be used as a picture-element electrode electrically connected to the second metal film 14 is deposited and etched into a specified shape.</p> |
