发明名称 ELECTROSTATIC CHUCK
摘要 <p>PURPOSE:To prevent a temperature distribution of a material to be treated from becoming irregular during treating. CONSTITUTION:A distance from a periphery of a conductive layer 15 interposed to be held between insulators 16 and 17 from both upper and lower sides to a surface of the insulator 16 is set shorter than a distance from a center to a surface of the insulator 16, and an electrostatic attraction force generated by applying a voltage from a high voltage DC power source 18 is strengthened higher at a periphery. Thus, a heat transfer rate of the periphery is improved to make a temperature distribution uniform.</p>
申请公布号 JPH06302678(A) 申请公布日期 1994.10.28
申请号 JP19930107364 申请日期 1993.04.09
申请人 TOKYO ELECTRON LTD 发明人 ENDO TAMIO
分类号 B23Q3/15;H01L21/302;H01L21/3065;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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