PREPARATION OF SOLAR CELL BASED ON WAFER SUBSTRATE

摘要

PURPOSE: To provide a method of manufacturing solar cells with wafer substrate suited for the mass production by possibly contacting solar cells from the bath side. CONSTITUTION: Through-holes 4 are formed in a wafer substrate by the electrochemical etching to form an n-doped single crystal Si perforated cantilever layer 7 in which n-doped regions 10, 13 and p-doped regions 9 are formed to form p-n junctions adjacent to a first main surface 2 of the cantilever layer 7. On the first main surface 2 contacts 15 corresponding to the n-doped regions 10, 13 and contacts 14 corresponding to the p-doped regions 9 are formed to result in that the p-n junctions act as solar cells capable of light incidence to through a second main surface 52 opposite to the first surface 2.