发明名称 PROCESSING METHOD FOR SEMICONDUCTOR WAFER
摘要 <p>PURPOSE:To avoid contamination of a wafer due to adhesive of an adhesive tape and an environmental contamination due to processing. CONSTITUTION:The method for processing a semiconductor wafer comprises the steps of bonding an adhesive tape formed by combining a base material 1 of a water soluble film for back grinding, dicing the wafer and/or water soluble adhesive layer 2 to the wafer 4, mixing it, after the previous step is finished, with water to clean it, thereby dissolving or dispersing the material 1 and the layer 2 to be removed, and completely removing contaminant remaining on the surface of the wafer 4.</p>
申请公布号 JPH06302691(A) 申请公布日期 1994.10.28
申请号 JP19930083719 申请日期 1993.04.12
申请人 MODERN PLAST KOGYO KK 发明人 YAMAGISHI TOSHIMASA
分类号 H01L21/304;H01L21/301;H01L21/78;(IPC1-7):H01L21/78 主分类号 H01L21/304
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