| 摘要 |
PURPOSE:To provide an exposure condition inspecting pattern, which quantitatively controls and stably keeps the accuracy of a product pattern to be transferred to the material to be exposed, an exposure original plate and exposure method which uses the pattern and the plate. CONSTITUTION:An exposure condition testing pattern 10 is composed of a light shielding pattern 11, which is formed by arranging the summits 11c and 11d of the corners of a pair of triangle patterns 11a and 11b formed of chromium light shielding film at a prescribed interval A, and a translucent pattern 12, which is formed by taking out the triangle patterns 12a and 12b from the chromium light shielding film so as to be translucent and by arranging the summits 12c and 12d to face at a prescribed interval B. The A+B, which is the sum of the measured values of the intervals A and B, reflects defocus quantity not depending on the exposure quantity, and since the difference B-A does not depend on the defocus quantity but reflects exposure quantity, the causes of the exposure condition fluctuation are discriminated and quantitative inspection is performed. |
