MANUFACTURE OF PHOTO-MASK AND PHOTO-MASK

摘要

PURPOSE:To sharply reduce the remaining rate of foreign objects on a photo- mask. CONSTITUTION:Grooves 1b are formed on the principal plane of a mask substrate 1a, then a shading conductor film is stacked on the principal plane of the mask substrate 1a so that its upper face is made nearly flat. The shading conductor film is etched back by the anisotropic dry etching method to form a shading film pattern 1c only in the grooves 1b.