Method for electron-induced material depositing

摘要

The invention relates to a method for electron-induced material depositing of electrically conductive materials which offers advantages in particular in material depositing on electrically non-conductive substrates. Electron-induced material depositing on insulators leads to the charging of the substrate and thus to an uncontrolled deflection of the electron beam near the surface. In the method according to the invention, one end of an electrically conductive, earthed wire is initially adjusted at a small distance from the surface of the substrate. Proceeding from the adjusted wire end, an electrically conductive connection to the surface of the substrate is deposited in an electron-induced fashion and continued thereon up to the desired position of the structure which is to be produced. The depositing of the desired structure then starts. The conductive connection is disconnected after the end of the depositing process. The charging of the substrate during the depositing process can be prevented in a reliable manner with this method. One possibility of use for the inventive method is for example in the production of sensing probes (tips) on quartz resonators (crystal resonators) for atomic force microscopy (AFM).