| 发明名称 |
REMOVAL OF SURFACE CONTAMINANTS BY IRRADIATION |
| 摘要 |
An apparatus and method for removing surface contaminants from a surface of a substrate provide a laminar flow of inert gas (18) over the substrate surface (12) while irradiating the substrate. The invention enables removal of surface contaminants without altering the underlying molecular crystal structure of the substrate. The source of high-energy irradiation includes a pulsed or continuous wave laser or high-energy lamp. |
| 申请公布号 |
WO9423854(A1) |
申请公布日期 |
1994.10.27 |
| 申请号 |
WO1994US03907 |
申请日期 |
1994.04.11 |
| 申请人 |
CAULDRON LIMITED PARTNERSHIP;ENGELSBERG, AUDREY, C. |
发明人 |
ENGELSBERG, AUDREY, C. |
| 分类号 |
B23K26/36;B08B7/00;B23K26/00;B23K26/14;G03F7/20;H01L21/00;H01L21/304;H01L21/306;H01L21/3205;H01L21/321;H01L21/768 |
主分类号 |
B23K26/36 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
