发明名称 Semiconductor double-channel-planar-buried-heterostructure laser diode effective against leakage current.
摘要 <p>A semiconductor double-channel-planar-buried-heterostructure laser diode has a pair of double channel structures (26/27) provided on both sides of a multiple quantum well structure (23) for blocking leakage current, and the leakage current is decreased by a carrier density of a current blocking layer (26) of each double channel structure ranging between 3 x 10&lt;1&gt;&lt;7&gt; cm&lt;-&gt;&lt;3&gt; and 1 x 10&lt;1&gt;&lt;8&gt; cm&lt;-&gt;&lt;3&gt; and equal to or less than a carrier density of a cladding layer (24) on the multiple quantum well structure, a width of each double channel structure ranging between 3.0 microns and 5.0 microns or a width of the multiple quantum well structure ranging between 1.6 microns and 2.2 microns. &lt;IMAGE&gt;</p>
申请公布号 EP0621665(A2) 申请公布日期 1994.10.26
申请号 EP19940104451 申请日期 1994.03.21
申请人 NEC CORPORATION 发明人 ISHIDA, TOMOKO, C/O NEC CORPORATION
分类号 H01S5/22;H01S5/227;H01S5/343;(IPC1-7):H01S3/19 主分类号 H01S5/22
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