Radiation sensitive resin composition.

摘要

A radiation sensitive resin composition useful as a negative type resist which can form a resist pattern having a good shape, has so high acid resistance as not to be affected by an etchant and a high adhesion to the substrate, and is endowed with so high a strippability as to be easily dissolved in a stripping solution consisting of an organoalkali. Said composition comprises (1) 100 parts by weight of an alkali-soluble novolak resin having a polystyrene reduced weight average molecular weight of 1,000 to 10,000, (2) 1 to 10 parts by weight of a compound having a methylol group and/or an alkoxymethyl group and being capable of cross-linking the alkali-soluble novolak resin (1) in the presence of an acid, and (3) 0.01 to 5 parts by weight of a radiation sensitive acid-generating agent represented by formula (I): <CHEM>