| 摘要 |
PURPOSE:To shorten the delivery time for production of ICs by providing an element group region for characteristic measurement where the width of a scribing region is larger than the width of element groups for characteristic measurement to be plotted in this scribing region. CONSTITUTION:The width b of the scribing region on the outermost periphery is larger than the width of the element groups TEG for scribing characteristic measurement and, therefore, the plotting of all the patterns of scribing TEG 3 in the scribing region on the right side of the outermost periphery is possible. The necessary width is assured for the required scribing width a plus the width b of the scribing region on the right side of the outermost periphery by setting the width c of the scribing region on the left side of the outermost periphery at c=a-b. Further, the plotting of the one scribing TEG pattern in the scribing region without dividing the pattern is possible and, therefore, the scribing region which can be plotted is increased and the plotting in perpendicular alignment like the scribing TEG 3, 4 is possible. |
