| 摘要 |
PURPOSE:To provide a photosensitive compsn. having high resolution, excellent in fine image pattern forming ability and useful as a positive photoresist, a printing material, etc., and to provide a pattern producing method using the photosensitive compsn. CONSTITUTION:This photosensitive compsn. contains a polymer having carboxyl groups as essential groups, a compd. having two or more vinyl ether groups in one molecule and a compd. which generates an acid when irradiated with active energy beams as essential components. |
