发明名称 SUBSTRATE ROTATING AND HOLDING DEVICE FOR ROTARY SUBSTRATE TREATMENT APPARATUS
摘要 <p>PURPOSE:To restrain a substrate from being turned idly in the whole time of its rotation by a simple constitution. CONSTITUTION:When a rotary stand 1 turns a substrate W, a ring-shaped magnet 20 which has been arranged and installed in a treatment-liquid collection cup 8 which can be raised and lowered, occupies an upper-part position and it is brought close to a substrate pressure member 11. As a result, the substrate pressure member 11 in which a permanent magnet has been built is pivoted, and its pressure face 11a comes into contact with, presses and energizes, the outer edge Wa of the substrate W. Since the ring-shaped magnet 20 is arranged to be a circumferential shape along the rotation track of one end 11b of the substrate pressure member 11, an always definite action can act irrespective of the turning position of the substrate pressure member 11. In addition, since the action of a magnetic force does not depend on the speed of revolution of the rotary stand 1, the substrate pressure member 11 presses and energizes the outer edge Wa in the whole time of its rotation. Since the substrate pressure member 11 on the rotary stand 1 is turned and moved by the magnetic force, a mechanism which drives the substrate pressure member 11 becomes simple. Thereby, it is possible to prevent the substrate from being turned idly in the whole time of its rotation by a simple constitution.</p>
申请公布号 JPH06291030(A) 申请公布日期 1994.10.18
申请号 JP19930098752 申请日期 1993.03.31
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YOSHIOKA KATSUJI;NAKAGAWA KOJI;ITABANE MASAYUKI;HIRAOKA NOBUYASU;TAKEOKA MASASHI
分类号 B05B13/02;B05C11/08;G11B7/26;H01L21/027;H01L21/30;H01L21/304;H01L21/306;H01L21/683;H01L21/687;(IPC1-7):H01L21/027;H01L21/68 主分类号 B05B13/02
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