| 摘要 |
PURPOSE:To provide a resist material excellent in resist properties such as sensitivity, resolution, etching resistance and preservable stability. CONSTITUTION:This resist composition contains a copolymer having structural units expressed by a formula I and formula II and a compound capable of forming an acid by irradiating with activated light in the molecular chain. In the formula I, each of R<1> and R<2> is the same or different from each other and is hydrogen atom, 1-5C alkyl group or the like, R<3> is an organic group having tertiary carbon bonding to oxygen. In the formula II, R<4> is hydrogen atom, 1-5C alkyl group or the like, and R<5> is 1-14C alkyl group, 1-14C substituted alkyl group or the like. |
