发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To improve heat resistance by using a specific condensation product of a compound having phenol structure and a compound having pyridine ring as a photosensitive base material. CONSTITUTION:The 1,2-naphthoquinone diazide-4-sulfonic ester or 1,2- naphthoquinone diazide-5-sulfonic acid ester of the condensation product of the compound expressed by a formula 1 and the compound expressed by a formula II is incorporated as an alkali soluble resin and a photosensitive agent. In the formulas I and II, each of R1-R5 is the same or different from each other and is hydrogen, hydroxide group, alkyl group, cycloalkyl group, allyl group, allyl group having substituted group, aralkyl group or aralykyl group having substituted group and at least one of R1-R5 is hydrogen. And (n) is an integer >=1 to <=5.
申请公布号 JPH06289606(A) 申请公布日期 1994.10.18
申请号 JP19930073805 申请日期 1993.03.31
申请人 MITSUBISHI KASEI CORP 发明人 OCHIAI TAMEICHI;KAMEYAMA YASUHIRO
分类号 G03F7/022;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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