发明名称 NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
摘要 The nonvolatile semiconductor memory device including a semiconductor substrate, a gate electrode group formed on the substrate with an insulating layer therebetween is structured, in which the gate electrode group includes floating gates formed of a first conductive layer, control gates formed of a second conductive layer placed on the floating gate, select gates formed of the first and second conductive layer on a portion opposite to the floating gate and control gate, the select gates are connected to each other through a contact hole formed on a field oxide layer.
申请公布号 KR940009644(B1) 申请公布日期 1994.10.15
申请号 KR19910020632 申请日期 1991.11.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KON - SU;IM, HYONG - KYU
分类号 G11C16/04;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115 主分类号 G11C16/04
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