发明名称 |
NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
The nonvolatile semiconductor memory device including a semiconductor substrate, a gate electrode group formed on the substrate with an insulating layer therebetween is structured, in which the gate electrode group includes floating gates formed of a first conductive layer, control gates formed of a second conductive layer placed on the floating gate, select gates formed of the first and second conductive layer on a portion opposite to the floating gate and control gate, the select gates are connected to each other through a contact hole formed on a field oxide layer.
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申请公布号 |
KR940009644(B1) |
申请公布日期 |
1994.10.15 |
申请号 |
KR19910020632 |
申请日期 |
1991.11.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, KON - SU;IM, HYONG - KYU |
分类号 |
G11C16/04;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115 |
主分类号 |
G11C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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