Method for masking and treating a surface of a substrate
摘要
It is proposed to cover a region of the surface of a substrate (SS) during a step of treating another region of the surface with a thin ice coating (ES) instead of a resist. The ice coating can be applied locally or over the entire surface or can be structured by melting-in a pattern (G). <IMAGE>
申请公布号
DE4318663(C1)
申请公布日期
1994.10.13
申请号
DE19934318663
申请日期
1993.06.04
申请人
SIEMENS SOLAR GMBH, 80807 MUENCHEN, DE
发明人
HOLDERMANN, KONSTANTIN, DIPL.-ING. (FH), 89362 OFFINGEN, DE
