发明名称 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE
摘要 A photosensitive composition comprising 35-80 parts by weight of a hydrophilic phosphate copolymer (A) prepared by copolymerizing a monomer mixture composed of 5-30 wt.% of an unsaturated phosphate monomer (a), 40-90 wt.% of a conjugated diene monomer (b) and 0-50 wt.% of a monoolefin monomer (c) other than the component (a), 65-20 parts by weight of a thermoplastic elastomer (B) (the total weight of components (A) and (B) being 100 parts by weight), 5-300 parts by weight of a photopolymerizable ethylenic monomer (C), and 0.1-10 parts by weight of a photopolymerization initiator. This composition is useful for producing photosensitive rubber plates and flexographic plates.
申请公布号 WO9423342(A1) 申请公布日期 1994.10.13
申请号 WO1994JP00543 申请日期 1994.03.31
申请人 NIPPON ZEON CO., LTD.;SUZUKI, TAKAO;SAKURAI, FUSAYOSHI;UENO, HARUO;KONISHI, ICHIRO;USUI, TATSUO 发明人 SUZUKI, TAKAO;SAKURAI, FUSAYOSHI;UENO, HARUO;KONISHI, ICHIRO;USUI, TATSUO
分类号 G03F7/033;(IPC1-7):G03F7/027 主分类号 G03F7/033
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