| 摘要 |
<p>PURPOSE:To provide a stable synthetic quartz glass for optical use, free from the generation of absorption band at 220nm and the emission of red light of 650nm by the irradiation with excimer laser, forming no absorption band even by irradiating with KrF excimer laser and ArF excimer laser over a long period and keeping the transmittance to excimer laser light. CONSTITUTION:A synthetic quartz glass is produced by hydrolyzing silicon tetrachloride in an oxyhydrogen flame. In the above process, the oxygen/ hydrogen ratio in the oxyhydrogen flame is in excess of hydrogen based on the stoichiometrically necessary amount and the obtained quartz glass containing >=1,000ppm by weight of OH group in the glass is heat-treated in hydrogen at >=800 deg.C.</p> |
