| 摘要 |
<p>PURPOSE:To increase the density of electrons, to increase the uniformity of main discharge and to make harmless nitrogen oxide 10 a large volume of stack gas by feeding electrons to the discharge field by a spark discharge due to a pin gap arc between a UV pin and a plasma electrode to perform the preliminary ionization of the stack gas. CONSTITUTION:In a stack gas treating device, since high voltage pulses of several tens of kV are applied to a plasma positive electrode 42 though a thyratron 58, a charging condenser 60 and a discharging condenser 56, a spark discharge is caused between the UV pin 62 and the negative electrode 44 to discharge electrons to a discharge plate. Next, a high density pulse glow discharge is caused in the main discharge field using the formed electricity as the nucleus to form plasma of electron density equal to that of a high voltage arc. Waste gas components are excited by this energy to make nitrogen oxide harmless. Further, preliminary ionization due to a pin gap arc is caused by the UV pin, allowing the electron density to be increased by the preliminary ionization action.</p> |
