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发明名称
MANUFACTURE OF GATE OXIDE FILM IN MOS SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH06283712(A)
申请公布日期
1994.10.07
申请号
JP19930092209
申请日期
1993.03.26
申请人
RICOH CO LTD
发明人
KAWABATA NAOKI
分类号
H01L21/316;H01L29/78;(IPC1-7):H01L29/784
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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