| 摘要 |
PURPOSE:To realize the reduced consumption of treatment liquid, the miniaturization of treatment device and easy handling and maintenance thereof. CONSTITUTION:A container 12 is formed by integrally jointing a pair of rectangular plate bodies 20 and 22 with bolts 24 and it has such a groove-shaped treatment chamber 26 that a semiconductor wafer W to be treated may be inserted between the inner side faces of the bodies 20 and 22. The upper end part of the container 12 is open and a board inlet 26a to insert/take out the wafer W into/from the chamber 26. The wafer W is inserted/took out into/from the chamber 26 by a pincette 28. A developing liquid, a rinsing liquid and an N2 gas are lead into the inside of the treatment chamber 26 from a lead-in port of the upper part of the chamber 26 via a passage in the container from a port of the bottom of the container. Respective fluids in the chamber 26 are discharged to the outside through a main exhaust passage and a main discharged port from a main discharged outlet provided on the lower part of the chamber 26. |
