| 摘要 |
PURPOSE:To provide high-resolution patterns without residues and surface damages by subjecting a photosensitive compsn. contg. a photocrosslinkable polymer having specific repeating units to exposing and developing, then washing the polymer with a specific rinsing liquid. CONSTITUTION:The photosensitive compsn. contg. the photocrosslinkable polymer having the repeating units expressed by formula I is subjected to removal of the unexposed parts by a developer and is then washed by >=10vol.% rinsing liquid contg. the compd. of liquid which is expressed by formula II in the method for forming the prescribed patterns from the photosensitive compsn. mentioned above by subjecting the compsn. to an exposing stage and developing stage. In the formula I, X denotes a carbon cyclic type or heterocyclic type of (2+n) valance and Y of (2+m) valance, respectively; Z is expressed by formula III. R denotes a group having carbon-carbon double bonds; W denotes the group which can form a ring by reacting with a carbonyl group of-COR; n is 1 or 2; m is 0, 1 or 2 and COR and Z are in a relation of ortho position, etc., with each other. In the formula II, R1 to R3 denote a hydrogen atom or 1 ot 8C alkyl group. |
