| 摘要 |
<p>PURPOSE:To provide the active matrix liquid crystal display device which can be manufactured by a small number of times of etching and can improve productivity. CONSTITUTION:Inside the same layer on an insulated substrate 36, mutually orthogonally intersecting gate line 37, signal line 38, gate electrode 39, drain electrode 40, spare capacity line, spare capacity electrode 41 and source electrode 42 are formed by etching. At the intersecting part of the gate line 37 and the signal line 38, the gate line 37 is divided so as not to be in contact with the signal line 38 and covered by a gate insulating layer 43 and afterwards, connection 52, 53 and 54 of through holes are formed at both parts corresponding to the gate electrode 39 and the source electrode 42 and a part corresponding to the divided terminal part. When forming a picture element electrode, a gap between the source electrode 42 and a picture element electrode 51, a gap between the gate are source electrodes 39 and 42 and an ormic contact layer 49 and a gap between the disconnected lines are connected through the connection parts 52, 53 and 54 by any picture element electrode material, respectively.</p> |
