| 发明名称 |
Control of time-dependent haze in the manufacture of integrated circuits |
| 摘要 |
The onset of haze on silicon wafers is controlled by treating the wafers with a chemical selected from the group consisting of hot water and isopropyl alcohol and then storing the treated wafers in an inert atmosphere such as nitrogen or argon.
|
| 申请公布号 |
US5352328(A) |
申请公布日期 |
1994.10.04 |
| 申请号 |
US19920991064 |
申请日期 |
1992.12.15 |
| 申请人 |
AT&T BELL LABORATORIES |
发明人 |
OBENG, YAW S.;VAJDA, EDWARD J. |
| 分类号 |
H01L21/304;H01L21/306;H01L21/324;(IPC1-7):H01L21/00;H01L21/02;B44C1/22;C03C15/00 |
主分类号 |
H01L21/304 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
