| 摘要 |
PURPOSE:To analyze the defect of circuit patterns and to feed the results of analyses back to an exposure machine for reticule production. CONSTITUTION:The two circuit patterns of the reticule 2 for exposing having the plural circuit patterns set on an X-Y stage 1 are converted to image data 4 by an image acquiring means 3. This image data 4 is subjected to positional correction, etc., by an image processing circuit 5 and is converted to the image data 6 to be inspected. This data is converted to comparison result data 9 by the presence or absence of a different part between both sets of the image data 6 to be inspected by a comparison circuit 7. On the other hand, the exposing data of the region including the different part of the circuit patterns stored in a magnetic disk 15 is retrieved by the comparison result data 9 and is converted to image data 17 by an image processing circuit 14. This comparison result data 9 and the image data 17 are synthesized by a display control circuit 10 and are displayed on a CRT 11, by which the form of the defect is analyzed. |
