发明名称 ELECTROSTATIC CHUCK
摘要 <p>PURPOSE:To provide an electrostatic chuck in which peeling of adhered parts of a susceptor and an insulating film or a resistor layer and the film due to change in thermal expansions or contractions of the susceptor and the layer can be suppressed. CONSTITUTION:An electrostatic chuck for attracting to hold an element 2 to be attracted at a mount surface of a susceptor 10 by an electrostatic force comprises a resistor layer 31 as a mount surface for attracting to mount the element 2 to be attracted, and an insulating film 20 arranged between the layer 31 and the susceptor 10, wherein an adhered part 21 of the film 20 to the layer 31 is formed to be asymmetrical to an adhered part 22 of the film 20 to the susceptor 10.</p>
申请公布号 JPH06275708(A) 申请公布日期 1994.09.30
申请号 JP19930089198 申请日期 1993.03.24
申请人 TOKYO ELECTRON LTD 发明人 DEGUCHI YOICHI;ISHIKAWA KENJI
分类号 B23Q3/15;H01L21/3065;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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