| 摘要 |
PURPOSE:To enhance pattern precision and processability by incorporating a siloxane polymer and a base generator. CONSTITUTION:This photosensitive resin composition contains the base generator and a product obtained by hydrolyzing or condensing the siloxane polymer of the formula: RXSiR'4-x in which R is H or optionally substituted alkyl or aryl, or the like, such as methyl, vinyl, phenyl, naphthyl, or an F-substituted group like trifluoromethyl, or an aminated group like 3-aminopropyl: R' is a hydrolyzable group, such as alkoxy like methoxy or ethoxy; and x is an integer of 0-3. |
