| 摘要 |
PURPOSE:To provide a method for automatically inspecting a pattern formed on a film carrier or the like. CONSTITUTION:A to-be-measured pattern is binarized from a dark-and-bright histogram which is formed by using a pattern of a good article as a master pattern, and converted into a set of straight lines according to the method of least squares from the edge data of the master pattern. A reference master pattern is formed by obtaining a central line LM and the width W of two straight lines confronting each other. The master pattern is registered with the to-be-measured pattern thereby to set an inspecting area. At the same time, the periphery of the inspecting area is inspected in a fixed direction, thereby to extract edge data of the to-be-measured pattern. When the edge data is turned to correspond to the straight lines of the master pattern, an error is detected. Accordingly, the article is detected to be good or bad. The pattern can be automatically inspected in this manner. |
