| 摘要 |
PURPOSE:To provide the filter substrate which is produce with an industrially high productivity and is advantageous in terms of cost by forming RGB patterns into diagonal line shapes by a printing method and combining these patterns with a black matrix film having apertures formed by a photolithography method of a black pigment resist. CONSTITUTION:The black pigment resist is applied on a substrate 1 and the black matrix 2 is formed by the photolithography method. The horizontal pitch of this matrix is 100mum, the vertical pitch 250mum and the width and length of the apertures are respectively 50mum and 120mum. The apertures 4 are rectangular and the sides thereof are parallel or perpendicular to the sides of the substrate 1. The diagonal RGB linear patterns 3 are formed by an offset printing system in superposition on the black matrix 2. The RGB linear patterns 3 have 70 deg. reference inclination with the substrate 1 and have 85mum reference width. The patterns incline partially, at need, and change the line width, but are continuous from the top end to the bottom end of the use range. The pitch of one color at the time of printing is 300mum and the pitch in the state of forming three colors R, G, B is 100mum. |
