发明名称 |
METHOD AND APPARATUS FOR THE COMBUSTION CHEMICAL VAPOR DEPOSITION OF FILMS AND COATINGS |
摘要 |
A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at least partially vaporized into a vapor phase, and contacting the vapor phase of the reagent to a substrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate, and an apparatus to accomplish this method. The figure shows a schematic of a CCVD apparatus where the substrate (22) can be placed within the reducing region (32) of the Smithell separator (30) between the inner flame (18a) and the outer flame (18b). |
申请公布号 |
WO9421841(A1) |
申请公布日期 |
1994.09.29 |
申请号 |
WO1994US03193 |
申请日期 |
1994.03.24 |
申请人 |
GEORGIA TECH RESEARCH CORP. |
发明人 |
HUNT, ANDREW, T.;COCHRAN, JOE, K.;CARTER, WILLIAM, BRENT |
分类号 |
C23C16/30;C23C16/40;C23C16/44;C23C16/448;C23C16/453;C23C16/513;C30B25/10 |
主分类号 |
C23C16/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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