A device with a charged beam has the following features: a vacuum chamber with a motion mechanism on the inside and a sample chamber (compartment). The sample chamber used is placed in an ultrahigh vacuum atmosphere or a gas atmosphere, a flat surface being formed on that surface of the motion mechanism which points towards the sample chamber and a flange having a flat open surface being arranged between the vacuum chamber and the sample chamber such that the open surface is opposite the flat surface, and is specifically formed with a small slot between the open surface and the flat surface to permit vacuum ventilation without any restrictions being placed on the motion mechanism, as a result of which the device operates without restricting the effect of the motion mechanism.
申请公布号
DE4408523(A1)
申请公布日期
1994.09.29
申请号
DE19944408523
申请日期
1994.03.14
申请人
AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY, TOKIO/TOKYO, JP