| 摘要 |
<p>The concentration of the major constituents present in a plating bath solution is monitored by (a) applying a dc potential to a pretreated electrode positioned in the solution to be monitored, the potential having an amplitude range of between 2.4 and 1.5 approx with a sweep rate of between about 20 to 1000mv. per sec.; (b) superimposing an ac signal onto the potential, the signal having an amplitude of approx 20 to 30 rms with a frequency of between approx 50 to 2000 H2; and (c) varying the dc potential at a chosen sweep rate and range, whilst measuring the ac current, produced at various phase angles, between the working electrode and a counter electrode, in relation to varying dc potential. Produce ac current spectra where the signal parameters of amplitude, frequency, sweep rate and range phase angle and electrode treatment are varied to determine their value and provide the maximum spectra detail from which to determine and monitor the major constituents in the solution having an effect on the plating deposition, where these constituents comprise more than 5% of the volume of the solution.</p> |
