发明名称 |
METHOD OF MANUFACTURING CAPACITOR |
摘要 |
The method improves the reliability of capacitors by forming a native oxide layer and a Ta2O5 layer. The method comprises (A) growing a native oxide (4) on an n-type Si substrate; (B) depositing a Ta2O5 layer (5) on the native oxide; (C) oxidizing the weakspot under oxidizing atmosphere; (D) forming a metal electrode (3) by sputtering or vapor depositing.
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申请公布号 |
KR940008893(B1) |
申请公布日期 |
1994.09.28 |
申请号 |
KR19870015499 |
申请日期 |
1987.12.31 |
申请人 |
GOLDSTAR ELECTRON CO., LTD. |
发明人 |
YUN, KI - WAN |
分类号 |
H01G4/00;(IPC1-7):H01G4/00 |
主分类号 |
H01G4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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