发明名称 Selected structurally defined novolak binder resins and their use in radiation-sensitive compositions
摘要 A novolak resin composition comprising at least one unit of the reaction product of a para-, para-bonded bisphenol having formula (A): <IMAGE> (A) wherein R1=hydrogen, lower alkyl group having 1-4 carbon atoms, halogen, or lower alkoxy group having 1-4 carbon atoms; wherein R2=hydrogen or lower alkyl group having 1-4 carbon atoms; and wherein X is selected from the group consisting of: CH2, CH(CH3), C(CH3)2, O, and S; with a bismethylol monomer selected from a difunctional ortho-, ortho-phenolic bismethylol of Formula (B), a difunctional ortho-, para-phenolic bismethylol of Formula (C): cted from CH3, CH2CH3, Cl, and Br; and wherein R4 is selected from H and CH3.
申请公布号 US5350827(A) 申请公布日期 1994.09.27
申请号 US19940194292 申请日期 1994.02.09
申请人 OCG MICROELECTRONIC MATERIALS, INC. 发明人 SARUBBI, THOMAS R.;SIZENSKY, JOSEPH J.
分类号 C08G8/08;G03F7/023;(IPC1-7):C08G8/04;C08G8/10 主分类号 C08G8/08
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