| 发明名称 |
Electrostatic apparatus and method for removing particles from semiconductor wafers |
| 摘要 |
Disclosed herein is an apparatus and method for cleaning the edges of semiconductor wafers by using a particle removing means having an electrostatically charged material. The particles are collected and disposed of so that they do not come in contact again with the clean semiconductor wafers.
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| 申请公布号 |
US5350428(A) |
申请公布日期 |
1994.09.27 |
| 申请号 |
US19930080165 |
申请日期 |
1993.06.17 |
| 申请人 |
VLSI TECHNOLOGY, INC. |
发明人 |
LEROUX, PIERRE;SCHMIDT, BRYAN D. |
| 分类号 |
H01L21/00;(IPC1-7):H01L21/30 |
主分类号 |
H01L21/00 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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