FORMATION OF MIRROR AT END OF OPTICAL WAVEGUIDE

摘要

PURPOSE:To drastically shorten the time for forming mirrors by simultaneously forming the many reflection mirrors at one time at the time of forming the reflection mirrors in the optical waveguides of thin-film optical waveguide parts. CONSTITUTION:A polyimide fluoride film A1 which constitutes optical waveguide cores 1 and a silicon system positive type photoresist A3 which constitutes an etching mask 3 are successively formed on a thermally oxidized silicon substrate 2. The photoresist A3 is patterned by using a, photomask 4 partly having mask patterns 6 of the size or density of apertures gradually increasing in the longitudinal direction of the optical waveguides. The photoresist A3 (etching mask 3) formed with sloped structures 7 and a lower layer film (polyimide film A1) thereof are etched by reactive ion etching, etc., using oxygen plasma P. The reflection mirrors 8 are formed on the optical waveguide cores 1 in the positions of the sloped structures 7.