发明名称 |
METAL OR SEMICONDUCTOR SUBSTRATE TO BE MADE-UP BY APPLYING RESIST AND ITS PREPARATION |
摘要 |
PURPOSE: To provide a metal or semiconductor substrate which is used for manufacturing a die for a micromechanical structure by deep X-ray lithography and coated with resist, and its manufacturing method. CONSTITUTION: Solution of linear organic compound having self organizing function and two terminal functional groups is spread on the surface of a substrate before resist is spread. As a result, a monomolecular layer is obtained, which acts as an adhesive layer which couples with both the substrate and the resist.
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申请公布号 |
JPH06267892(A) |
申请公布日期 |
1994.09.22 |
申请号 |
JP19930256183 |
申请日期 |
1993.10.13 |
申请人 |
II M M INST FUR MIKUROTEHINIIKU GMBH |
发明人 |
RAINAA SHIENKU;MIHIYAERU ABURAHAMU;BORUFUGANGU ERUFUERUTO |
分类号 |
G03F7/16;G03F7/11;H01L21/312;(IPC1-7):H01L21/30 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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