发明名称 METAL OR SEMICONDUCTOR SUBSTRATE TO BE MADE-UP BY APPLYING RESIST AND ITS PREPARATION
摘要 PURPOSE: To provide a metal or semiconductor substrate which is used for manufacturing a die for a micromechanical structure by deep X-ray lithography and coated with resist, and its manufacturing method. CONSTITUTION: Solution of linear organic compound having self organizing function and two terminal functional groups is spread on the surface of a substrate before resist is spread. As a result, a monomolecular layer is obtained, which acts as an adhesive layer which couples with both the substrate and the resist.
申请公布号 JPH06267892(A) 申请公布日期 1994.09.22
申请号 JP19930256183 申请日期 1993.10.13
申请人 II M M INST FUR MIKUROTEHINIIKU GMBH 发明人 RAINAA SHIENKU;MIHIYAERU ABURAHAMU;BORUFUGANGU ERUFUERUTO
分类号 G03F7/16;G03F7/11;H01L21/312;(IPC1-7):H01L21/30 主分类号 G03F7/16
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