PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD

摘要

PURPOSE:To provide a positive pattern forming material having high sensitivity and high resolution and giving a satisfactory cross-sectional shape rising perpendicularly from the surface of a substrate. CONSTITUTION:An alkali-soluble resin, a vinyl polymer having acid- decomposable groups such as tetrahydropyranyloxy groups and a compd. which generates an acid when irradiated with active chemical rays, e.g. tri-substd. ester of pyrogallol with methanesulfonic acid are dissolved in methylcellosolve acetate to obtain the objective pattern forming material. The wt. average mol.wt. of the vinyl polymer is within the range of 1,500-3,000. A substrate is coated with the pattern forming material, irradiated with electron beams and baked. The irradiated part is then removed by development with an org. alkali developer to form a positive pattern.