IMPROVED PHOTORESIST COMPOSITION

摘要

PURPOSE: To obtain a chemically sensitized photoresist compsn. having high heat stability and sensitive to an acid. CONSTITUTION: This photoresist compsn. contains a photosensitive acid generating body and a polymer contg. a reactional product of hydroxystyrene with an acrylate, a methacrylate or a mixture of them, has improved heat stability and is almost independent of pollutants in air.