| 摘要 |
PURPOSE:To provide a pattern defect inspection method and device, capable of performing a stringent inspection easily without entailing any complication to its constitution even in the case of such a sample as a phase shift mask. CONSTITUTION:In a pattern defect inspection method which detects the defect of an inspected pattern by way of comparing (16, 17) both of measuring data (S) obtained after optically scanning a sample formed with the inspected pattern and designed data (Q) used in time of forming the inspected pattern to the sample successively, such a inspecting method as securing defect information on the inspected pattern upon comparing (19, 20, 21, 22 and 23) measured data themselves at each constant range portion to be obtainable in consecutive order by at least scanning in an area where a constant-form pattern is repeatedly formed, is adopted. |
