PROCESS TO CREATE SURFACE PATTERN AND APPLICATIONS THEREOF

摘要

2.1 The aim is to indicate a particularly simple process of said type by means of which relief-like surface structures of any desired type can be produced in a controlled and readily reproducible manner. 2.2 To this end, a photoresist coating having a relief-like surface structure essentially the same as the relief-like surface structure to be produced on the surface of the substrate is produced on the surface of the substrate, and the photoresist is removed using a removal process which removes both the photoresist and photoresist-free and/or -liberating substrate material. 2.3 The process can be used in all cases where surface structures which are microstructured in a relief-like manner are used, such as in optics or micromechanics.