发明名称 FILM FOR PREVENTING ICE AND SNOW ACCRETION AND ITS PRODUCTION
摘要 PURPOSE:To obtain the subject film which is very thin and excellent in scratch resistance by forming a monomolecular film or a built-up film by causing molecules having linear organosiloxane backbones to be chemically adsorbed in an oriented state to the surface of a substrate. CONSTITUTION:A substance having one chlorosilyl group at the molecular terminal, (e.g. CH3-[Si(CH3)2O]6-SiCl3 or Cl-[Si(CH3)2O]7SiCl3) is dissolved in a concn. of about 4wt.% into a nona medium to give a chemical adsorbent. When a well-dried hydrophilic substrate 1 is immersed in the adsorbent for about 2hr, the dehydrochlorination between SiCl groups of the adsorbent and hydroxyl groups on the surface of the substrate 1 having many hydroxy groups 2 occurs. Then, the surface is washed well with an org. solvent to remove an excess surfactant remaining on the surface and washed with water, thus giving a monomolecular organosiloxane film 3 chemically bonded to the surface in a thickness of about 20Angstrom .
申请公布号 JPH06264051(A) 申请公布日期 1994.09.20
申请号 JP19930053685 申请日期 1993.03.15
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OGAWA KAZUFUMI
分类号 C03C17/30;C09K3/18;(IPC1-7):C09K3/18 主分类号 C03C17/30
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