Flash memory cell and its operation

摘要

A method of operating a flash memory semiconductor device is provided. The semiconductor device formed on a substrate lightly is doped with a dopant. A source region and a drain region are formed in the substrate on the surface thereof. A dielectric layer is deposited upon the substrate. A floating gate electrode is formed on the dielectric layer proximate to at least the edges of the source region and the drain region. Additional dielectric material is deposited upon the surface of the floating gate electrode, and a gate electrode is deposited upon the surface of the additional dielectric material.