X-RAY MASK STRUCTURE AND MANUFACTURE THEREOF, X-RAY EXPOSURE METHOD USING THE STRUCTURE AND SEMICONDUCTOR DEVICE MANUFACTURE ACCORDING TO THE METHOD

摘要

PURPOSE:To prevent the occurrence of a mask pattern deformation clue to the bonding agent for bonding a supporting frame and a holding frame, by forming a bonding layer of bonding agents and a member for controlling the volume of the bonding agents. CONSTITUTION:A mask substrate 2 and a holding frame 1 are laminated by a bonding layer A. Into the bonding layer A, a ring-shaped SUS spacer 7 of a foil sheet is inserted, and two-liquid polymerization type bonding agents 3A and 3B are applied on the surface and rear of the spacer 7. By this, even in the bonding of the mask substrate and the holding frame which are varying in thickness, the deformation of the mask substrate due to the cure shrinkage of bonding agent can be suppressed to a minimum, and if a bonding agent having a relatively large line expansion coefficient is used, the deformation of the bonding layer due to temperature change can be suppressed to a minimum, whereby the deformation of the mask pattern can be suppressed.