Process for preparation of disilane from monosilane by electric discharge and use of a cryogenic trap and reactor for carrying out the process.

摘要

In a process and a reactor for the production of disilane from monosilane, according to which gaseous monosilane is passed into a reaction region (5) where it is subjected to an electric discharge generated by a high frequency current (13), a) the monosilane is used in the form of a mixture (14) with at least one inert gas chosen from the group formed by helium and argon, b) the pressure of the gaseous mixture in the reaction region is between 0.1 and 3 bars, and c) the gaseous mixture is brought into contact in the reaction region, under an electric discharge, with a wall (3) cooled to a temperature which is sufficiently low for the saturated vapour pressure of the disilane to be negligible but not sufficiently low for the monosilane to be able to condense at the partial operating pressure.