发明名称
摘要 A method and equipment for fabricating two diffraction gratings having the same period but phases that are shifted by lambda /4 on a work to be treated. A laser beam is divided into two light beams and one of the beams is delayed over a portion of the light beam. The divided light beams are then mixed together so that they interfere. Using the known photolithography technology, the interference patterns are formed into diffraction gratings.
申请公布号 JPH0672962(B2) 申请公布日期 1994.09.14
申请号 JP19850158169 申请日期 1985.07.19
申请人 发明人
分类号 G02B5/18;G02B6/12;G02B6/122;(IPC1-7):G02B5/18 主分类号 G02B5/18
代理机构 代理人
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