| 摘要 |
PURPOSE:To obtain a compsn. which is suitable for electroplating, electroless plating, an interlayer insulation film, a film for circuit board protection, etc. CONSTITUTION:This photoresist compsn. contains a copolymer made from an unsatd. carboxylic acid, an epoxidized radical-polylmerizable compd., and another radical-polymerizable compd., a polymerizable compd. having at least one ethylenically unsaid. bond, and a photopolymn. initiator. |
