摘要 |
A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter <IMAGE> (I) in which R1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical, R2 is a hydrogen atom, an unsubstituted or substituted alkyl radical, or an unsubstituted or substituted aryl radical, (R1-SO2-O-)nX-, or R3O-, R3 and R4 are identical or different and are unsubstituted or substituted alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals, in which 1 to 3 aliphatic CH2 or CH groups are optionally replaced by one or more of NR5, O, S, CO, CO-O, CO-NH, O-CO-NH, CO-NH-CO, NH-CO-NH, SO2, SO2-O or SO2-NH, or unsubstituted or substituted alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals, or R3 and R4 are mutually linked to form an unsubstituted or substituted heterocyclic ring, R5 is an acyl radical, n is an integer from 1 to 3, and X is an alkylene, cyloalkylene, or arylene group. and which, in combination with alkali-soluble binders, give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.
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申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
PAWLOWSKI, GEOG;DAMMEL, RALPH;ROESCHERT, HORST;SPIESS, WALTER;ECKES, CHARLOTTE |